Resist-Wiki: Interferenzlithographie - Allresist DE
Ratio resolution and dose exemplarily shown for e-beam resist SX AR-N 7530/1
High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field | Scientific Reports
Independent-Exposure Method in Electron-Beam Lithography | IntechOpen
Spatial modulation of nanopattern dimensions | EurekAlert!
Exposure of Photoresists
Photolithography
Lithography
The relation between the photoresist film thickness after the... | Download Scientific Diagram
Willson Research Group - Research - Double Exposure Lithography
Exposure of Photoresists
Proximity Effect Correction | Electron Dose
A comprehensive nano-interpenetrating semiconducting photoresist toward all- photolithography organic electronics | Science Advances
a) The relation of exposure dose and spot width (exposure: 1.5, 1.4... | Download Scientific Diagram
9. How are photo resists exposed, and how can the optimum exposure dose be determined? How long can coated and exposed substrates be stored prior to exposure? - Allresist EN
A) The diagram of feature size and exposure dose (intensity and... | Download Scientific Diagram
Simulation result of dose modulation. With decreasing exposure dose,... | Download Scientific Diagram
Pronounced-undercut-with-increasing-exposure-dose - Allresist EN
Lithography
Exposure of Photoresists
Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers - ScienceDirect
Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method: Journal of Vacuum Science & Technology B: Vol 34, No 4
Process study and the lithographic performance of commercially available silsesquioxane based electron sensitive resist Medusa 82 - ScienceDirect
Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method: Journal of Vacuum Science & Technology B: Vol 34, No 4
Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam: AIP Advances: Vol 6, No 8
